Diamond and its preparation by chemical vapor deposition method

Details Diamond and its preparation by chemical vapor deposition method Diamond and its preparation by chemical vapor deposition method

1992-05-18

1993-12-14

Kunemund, Robert

Chemistry of inorganic compounds

Carbon or compound thereof

Elemental carbon

427577, 156DIG68, C01B 3106

Patent

active

052700283

ABSTRACT:
A diamond having improved properties is produced by a method which comprises introducing a mixture of hydrogen (A), an inert gas (B) and a carbon-containing compound (C) in molar ratios which satisfy the following equations: ##EQU1## generating a low temperature plasma with one of direct current and an alternating current electromagnetic field under pressure of 5 to 760 Torr to form the diamond on a substrate, wherein there is no substantial differnce between a place where the plasma is generated and a place where the diamond is formed on the substrate.

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