Organic compounds -- part of the class 532-570 series – Organic compounds – Oxygen containing
Reexamination Certificate
2006-07-18
2006-07-18
Shippen, Michael L. (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Oxygen containing
Reexamination Certificate
active
07078573
ABSTRACT:
A process for producing bisphenol A is disclosed. The process entails a) reacting phenol with acetone in the presence of an acidic catalyst to form a reaction mixture that includes bisphenol A and water, and b) removing water from the reaction mixture by distillation in a column to obtain a bottom product, and c) separating bisphenol-A/phenol adduct from the reaction mixture by crystallization and filtration. The bottom temperature of the column is 100 to 150° C., the overhead temperature of the column is 20 to 80° C., the absolute pressure is 50 to 300 mbar at the head of the column and 100 to 300 mbar at the bottom of the column, and wherein said (c) is carried out before or after said (b).
REFERENCES:
patent: 4950804 (1990-08-01), Iimuro et al.
patent: 4994594 (1991-02-01), Silva et al.
patent: 5723688 (1998-03-01), Patrascu et al.
patent: 5785823 (1998-07-01), Meurer et al.
patent: 6586637 (2003-07-01), Iwahara
patent: 6653513 (2003-11-01), Iwahara
patent: 6723885 (2004-04-01), Heydenreich et al.
patent: 2003/0013925 (2003-01-01), Iwahara
patent: 2004/0030196 (2004-02-01), Saruwatari et al.
“Kirk-Othmer Encyclopedia of Chemical Technology,” 4th Ed., vol. 19, pp. 584-599 (1996)).
Blaschke Ulrich
Neumann Rainer
Westernacher Stefan
Bayer Materialscience AG
Shippen Michael L.
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