Devices for preparing substrates coated with a thin layer of pla

Details Devices for preparing substrates coated with a thin layer of pla Devices for preparing substrates coated with a thin layer of pla

1983-09-09

1985-04-16

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, 204192C, 204192SP, 428432, 428469, 428615, 428629, 428669, 428670, C23C 1500

Patent

active

045114510

ABSTRACT:
To coat a substrate with a thin layer of pure platinum oxide, an insulating and transparent substance, recourse is had to a cylindrical magnetron comprising means for generating an axial magnetic field in an enclosure containing rarefied oxygen, an axial cathode at least coated with platinum and a cylindrical grid forming an anode and coaxially surrounding the cathode so as to reserve an annular zone outside the grid. The substrate is placed in the said zone so that its surface to be coated by the thin layer is shielded from the impact of electrons. This shielding can be obtained by a particular shape given to the bars constituting the grid or by the positioning of obstacles in the said zone. It then suffices to heat the thin layer, whether or not locally, to above 250.degree. C., to convert it into conducting and opaque platinum.

REFERENCES:
patent: 4440108 (1984-04-01), Little et al.

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