Devices and processes for performing degassing operations

Plastic article or earthenware shaping or treating: apparatus – Control means responsive to or actuated by means sensing or... – Feed control of material en route to shaping area

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C425S210000, C425S404000, C425S812000, C220S581000, C220S202000, C220S264000

Reexamination Certificate

active

07625197

ABSTRACT:
A preferred process for degassing a mold piece includes inserting the mold piece into an internal volume within a canister, sealing the internal volume, drawing a vacuum in the internal volume, and introducing into the internal volume a gaseous fluid suitable for degassing the mold piece.

REFERENCES:
patent: 3423488 (1969-01-01), Bowser
patent: 4298357 (1981-11-01), Pernic
patent: 5578331 (1996-11-01), Martin et al.
patent: 5656208 (1997-08-01), Martin et al.
patent: 5753150 (1998-05-01), Martin et al.
patent: 5871566 (1999-02-01), Rutz
patent: 6695988 (2004-02-01), Schlagel et al.
patent: 6740139 (2004-05-01), Russell et al.
patent: 6883675 (2005-04-01), Maenke
patent: 7334708 (2008-02-01), Xu et al.
patent: 7383964 (2008-06-01), Keller
patent: 2004/0112008 (2004-06-01), Voss et al.
patent: 0750982 (1997-01-01), None
patent: WO 98/32587 (1998-07-01), None
PCT International Search Report, dated Jan. 18, 2007, for PCT Int'l Appln. No. PCT/US2006/034228.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Devices and processes for performing degassing operations does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Devices and processes for performing degassing operations, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Devices and processes for performing degassing operations will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4134689

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.