Devices and methods for thermophoretic and electrophoretic...

Drying and gas or vapor contact with solids – Material treated by electromagnetic energy – Ultraviolet energy

Reexamination Certificate

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C355S030000, C250S50400H, C219S502000, C430S403000, C156S345400

Reexamination Certificate

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07367138

ABSTRACT:
Apparatus and methods are disclosed for reducing particle contamination of a surface of an object such as a reticle used in an EUV lithography system. An exemplary apparatus includes a thermophoresis device and an electrophoresis device. The thermophoresis device is situated relative to and spaced from the surface, and is configured to produce a thermophoretic force, in a gas flowing past and contacting the surface, sufficient to inhibit particles in the gas from contacting the surface. The electrophoresis device is situated relative to a region of the surface contacted by the gas and is configured to deflect particles, having an electrostatic charge, in the gas away from the region as the gas flows past the region. In an example, the thermophoresis device produces the thermophoretic force by establishing a temperature gradient in the gas relative to the surface, and the electrophoresis device includes an electrode situated and configured to produce a voltage gradient relative to the region of the surface sufficient to attract charged particles away from the region of the surface.

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MacGibbon et al., “The Effect of Thermophoresis on Particle Deposition in a Tungsten Low Pressure Chemical Vapor Deposition Reactor,” Journal of The Electrochemical Soecity, 146 (8) 2901-2905 (1999).
Rader et al., “Verification studies of thermophoretic protection for EUV masks,” Emerging Lithographic Technologies IV, Proceedings of SPIE vol. 4688, 2002, pp. 182-193.

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