Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2011-01-25
2011-01-25
Berman, Jack I (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C034S275000, C355S030000
Reexamination Certificate
active
07875864
ABSTRACT:
Apparatus and methods are disclosed for reducing particle contamination of a surface of an object such as a reticle used in an EUV lithography system. An exemplary apparatus includes a thermophoresis device and an electrophoresis device. The thermophoresis device is situated relative to and spaced from the surface, and is configured to produce a thermophoretic force, in a gas flowing past and contacting the surface, sufficient to inhibit particles in the gas from contacting the surface. The electrophoresis device is situated relative to a region of the surface contacted by the gas and is configured to deflect particles, having an electrostatic charge, in the gas away from the region as the gas flows past the region. In an example, the thermophoresis device produces the thermophoretic force by establishing a temperature gradient in the gas relative to the surface, and the electrophoresis device includes an electrode situated and configured to produce a voltage gradient relative to the region of the surface sufficient to attract charged particles away from the region of the surface.
REFERENCES:
patent: 5373806 (1994-12-01), Logar
patent: 5472550 (1995-12-01), Periasamy
patent: 6153044 (2000-11-01), Klebanoff et al.
patent: 6253464 (2001-07-01), Klebanoff et al.
patent: 6642531 (2003-11-01), Powers
patent: 6781673 (2004-08-01), Moors et al.
patent: 7367138 (2008-05-01), Sogard
patent: 2004/0000519 (2004-01-01), Jiang et al.
patent: 2004/0119394 (2004-06-01), Klebanoff et al.
patent: 2007/0211232 (2007-09-01), Phillips et al.
MacGibbon et al., “The Effect of Thermophoresis on Particle Deposition in a Tungsten Low Pressure Chemical Vapor Deposition Reactor,” Journal of The Electrochemical Soecity, 146 (8) 2901-2905 (1999).
Rader et al., “Verification studies of thermophoretic protection for EUV masks,” Emerging Lithographic Technologies IV, Proceedings of SPIE vol. 4688, 2002, pp. 182-193.
U.S. Appl. No. 10/898,475, filed Jul. 2004, Sogard.
Berman Jack I
Klarquist & Sparkman, LLP
Nikon Corporation
LandOfFree
Devices and methods for thermophoretic and electrophoretic... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Devices and methods for thermophoretic and electrophoretic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Devices and methods for thermophoretic and electrophoretic... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2712964