Device used in parallel microsynthesis

Chemical apparatus and process disinfecting – deodorizing – preser – Control element responsive to a sensed operating condition

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C422S105000

Reexamination Certificate

active

07132081

ABSTRACT:
Microwells, which are open on both sides and are arranged two-dimensionally in a microwell matrix (4), are hermetically closed by pressure on both sides using plugs (6) covered with a sealing sheet (11). A layer of elastic material (9), which is arranged between the plug (6) and the sealing sheet (11), guarantees uniform pressure on all the microwells of a microwell matrix (4) which is loosely held by a frame structure (1). Continuous peripheral elevations (2), which protrude in both directions at right angles to the plane of the microwell matrix (4), ensure that the deformable thin layer of elastic material (9) does not escape sideways between the plug (6) and the microwell matrix (4) during the pressing process. A plurality of microwell matrices (4) are held simultaneously by the frame structure (1) and are hermetically closed by a corresponding number of allocated plugs (6), which are fastened to a base plate (7) and a cover plate (8), respectively.

REFERENCES:
patent: 4857409 (1989-08-01), Hazelton et al.
patent: 6054100 (2000-04-01), Stanchfield et al.
patent: 19843655 (2000-03-01), None
patent: 0299741 (1989-01-01), None
patent: WO 9822219 (1998-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device used in parallel microsynthesis does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device used in parallel microsynthesis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device used in parallel microsynthesis will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3671851

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.