Coating apparatus – Gas or vapor deposition – Work support
Patent
1990-03-07
1991-12-24
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
118715, C23C 1424
Patent
active
050742469
ABSTRACT:
Apparatus and method for depositing on the flat surface (4) of a substrate (1) a layer of uniform thickness of particles emitted by a source (5). The substrate (1) is held at the extremity of a radial arm (2) which arm in turn is carried on a rotating axis (3). The substrate also rotates on the arm (2) and is carried on the arm so that the flat surface (4) is orientated such that a line drawn normal to the flat surface forms an angle (.theta.) with the axis (3). The apparatus is particularly suited for the production of optical parts.
REFERENCES:
patent: 3746571 (1973-07-01), Little
patent: 3783822 (1974-01-01), Wollam
patent: 3858547 (1975-01-01), Bergfelt
patent: 4010710 (1977-03-01), Williams
patent: 5002011 (1991-03-01), Ohmine
Gailliard Jean-Pierre
Perrin Aime
Bueker Richard
Commissariat a l''Energie Atomique
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