Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1994-08-19
1995-11-07
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, 2041828, G01N 2726, G01N 27447
Patent
active
054645212
ABSTRACT:
A gel/mask set intended for the deposition, spreading and incubation of one or several liquid reagents on a gel layer (of total surface Sg) according to one or several well-defined zones of gel, here-after designated by "incubation surface Si", this gel/mask set includes the gel layer itself and a rigid mask having a flat upper surface and a flat lower surface substantially parallel to the upper surface, at least one orifice intended to permit deposition and spreading of the liquid reagents by capillarity on the incubation surface Si of the gel layer, and at least one slit crossing the mask over the whole of its thickness and intended to permit withdrawal of any excess liquid reagent present on the incubation surface Si of the gel layer. Stops on the lower periphery of the mask rest on the gel layer and space the lower surface of the mask away from the gel layer by at least 0.1 mm. This invention is useful in staining for further study a gel layer previously subjected to a electrophoretic migration, particularly where the liquid reagent used for staining is expensive or must be conserved for other reasons.
REFERENCES:
patent: 3428547 (1969-02-01), Zec
patent: 3844918 (1974-10-01), Cawley
patent: 4919784 (1990-04-01), Yetman
A. J. Crowle "Templates for Antiserum Application in Immunoelectrophoresis and Two-Dimensional Electroimmunodiffusion" Journal of Immunological Methods, vol. 14 (1977) 197-200.
Niebling John
Sebia
Starsiak Jr. John S.
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