Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2008-01-08
2008-01-08
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S394000
Reexamination Certificate
active
07316870
ABSTRACT:
Isolated dark features, e.g. contact holes or lines, are exposed in a double exposure, using different illumination settings in the two exposures.
REFERENCES:
patent: 5045419 (1991-09-01), Okumura
patent: 5532090 (1996-07-01), Borodovsky
patent: 5686223 (1997-11-01), Cleeves
patent: 6528238 (2003-03-01), Seniuk et al.
patent: 6534242 (2003-03-01), Sugita et al.
patent: 6875545 (2005-04-01), Eurlings et al.
patent: 6934007 (2005-08-01), Fritze et al.
patent: 2002/0100012 (2002-07-01), Sutani et al.
patent: 2002/0195539 (2002-12-01), Nakao et al.
patent: 2003/0054263 (2003-03-01), Kanaya
Eurlings Markus Franciscus Antonius
Finders Jozef Maria
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Rosasco S.
LandOfFree
Device manufacturing method, mask set for use in the method,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device manufacturing method, mask set for use in the method,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device manufacturing method, mask set for use in the method,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2790157