Device manufacturing method, device manufactured thereby and...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S075000

Reexamination Certificate

active

07081945

ABSTRACT:
A device manufacturing method includes performing field-by-field multiple exposure. In this way, each target portion (or field) of a substrate can be irradiated while maintaining high overlay accuracy. Optionally, when each target portion is exposed in the same manner, a high reproducibility of the feature sizes on the substrate can be secured. Further, a mask table holds a plurality of masks that are arranged side-by-side in a direction substantially perpendicular to a scan direction. Such an arrangement enables field-by-field multiple exposure without a throughput loss.

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English translation of Japanese Patent document 2000-21715.

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