Device manufacturing method and lithographic apparatus

Details Device manufacturing method and lithographic apparatus Device manufacturing method and lithographic apparatus

2008-12-29

2011-11-01

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000

Reexamination Certificate

active

08049864

ABSTRACT:
A device manufacturing method includes a measurement phase and an exposure phase. The measurement phase includes conditioning a radiation beam with a first beam condition, forming the patterned radiation beam by imparting the radiation beam with the first beam condition with a first pattern in its cross-section, and projecting the patterned beam onto a sensor capable of providing a sensor output signal. The exposure phase includes fast switching the conditioning of the radiation beam to a second beam condition, the second beam condition being different from the first beam condition, forming the patterned radiation beam by imparting the radiation beam with the second beam condition with a second pattern in its cross-section, the second pattern being provided by a patterning device, and projecting the patterned beam onto a target portion of the substrate.

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patent: 2009-105417 (2009-05-01), None
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