Device manufacturing method and lithographic apparatus

Details Device manufacturing method and lithographic apparatus Device manufacturing method and lithographic apparatus

2007-01-17

2008-09-16

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S071000, C355S077000, C378S034000

Reexamination Certificate

active

07426015

ABSTRACT:
A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.

REFERENCES:
patent: 4825247 (1989-04-01), Kemi et al.
patent: 6545746 (2003-04-01), Nishi
patent: 6870598 (2005-03-01), Nishi
patent: 7130016 (2006-10-01), Miyajima
patent: 2003/0025889 (2003-02-01), Hasegawa et al.
patent: 2004/0035570 (2004-02-01), Hara et al.
patent: 2005/0054217 (2005-03-01), Klomp et al.
patent: 2006/0007413 (2006-01-01), Nanba
patent: 2006/0126041 (2006-06-01), Van Dijsseldonk et al.
patent: 2006/0175558 (2006-08-01), Bakker et al.
patent: 2006/0176455 (2006-08-01), Nomoto
patent: 1 376 239 (2004-01-01), None
patent: 2005/010617 (2005-02-01), None
patent: 2005/101122 (2005-10-01), None
International Search Report and Written Opinion for International Application No. PCT/IB2008/050160 dated Jul. 1, 2008.

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