Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2008-09-16
2008-09-16
Rutledge, Della J. (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S067000, C355S071000, C355S077000, C378S034000
Reexamination Certificate
active
11654037
ABSTRACT:
A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.
REFERENCES:
patent: 4825247 (1989-04-01), Kemi et al.
patent: 6545746 (2003-04-01), Nishi
patent: 6870598 (2005-03-01), Nishi
patent: 7130016 (2006-10-01), Miyajima
patent: 2003/0025889 (2003-02-01), Hasegawa et al.
patent: 2004/0035570 (2004-02-01), Hara et al.
patent: 2005/0054217 (2005-03-01), Klomp et al.
patent: 2006/0007413 (2006-01-01), Nanba
patent: 2006/0126041 (2006-06-01), Van Dijsseldonk et al.
patent: 2006/0175558 (2006-08-01), Bakker et al.
patent: 2006/0176455 (2006-08-01), Nomoto
patent: 1 376 239 (2004-01-01), None
patent: 2005/010617 (2005-02-01), None
patent: 2005/101122 (2005-10-01), None
International Search Report and Written Opinion for International Application No. PCT/IB2008/050160 dated Jul. 1, 2008.
Meijer Hendricus Johannes Maria
Renkens Michael Jozef Mathijs
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Rutledge Della J.
LandOfFree
Device manufacturing method and lithographic apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device manufacturing method and lithographic apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device manufacturing method and lithographic apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3930007