Device manufacturing method and computer program

Details Device manufacturing method and computer program Device manufacturing method and computer program

2006-05-09

2006-05-09

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000, C430S005000

Reexamination Certificate

active

07042550

ABSTRACT:
System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z5astigmatism, Z9spherical, and Z12astigmatism.

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Katsura Otaki, “Asymmetric Properties of the Aerial Image in Extreme Ultraviolet Lithography,”Jpn. J. Appl. Phys. 39:6819-6826 (2000).
Chen et al., “Simulation on a New Reflection Type Attenuated Phase Shifting Mask for Extreme Ultraviolet Lithography,”SPIE, vol. 3676, Mar. 1999, pp. 578-586.

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