Device manufacturing method and a lithographic apparatus

Details Device manufacturing method and a lithographic apparatus Device manufacturing method and a lithographic apparatus

2006-07-11

2006-07-11

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S077000, C430S311000

Reexamination Certificate

active

07075617

ABSTRACT:
A device manufacturing method is disclosed. The method includes patterning a beam of radiation with a patterning device, projecting the patterned beam of radiation onto a target portion of a substrate, supplying a chemical reagent to a chamber that holds the patterning device and/or the substrate, and removing water from the chamber with use of the chemical reagent.

REFERENCES:
patent: 4660297 (1987-04-01), Danielson
patent: 6323463 (2001-11-01), Davis et al.
patent: 6535270 (2003-03-01), Murayama
patent: 2003/0035087 (2003-02-01), Murayama
patent: 0 709 635 (1996-05-01), None
patent: 0 719 979 (1996-07-01), None
patent: 0 719 979 (1997-05-01), None
patent: 09283401 (1997-10-01), None
patent: WO95/03622 (1995-02-01), None
patent: WO01/32531 (2001-05-01), None
A. Berman, “Walter vapor in vacuum systems,”Vacuum, 1996, 47(4):327-332, XP000572451.
K. Tatenuma et al., “Quick acquisition of clean ultrahigh vacuum by chemical process technology,”Journal of Vacuum Science & Technology, 1993, 11(4):1719-1724, XP000403685.

Affiliated with

Also associated with

Rating

Device manufacturing method and a lithographic apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device manufacturing method and a lithographic apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device manufacturing method and a lithographic apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3539517