Device manufacture involving step-and-scan delineation

Details Device manufacture involving step-and-scan delineation Device manufacture involving step-and-scan delineation

1991-12-30

1993-11-09

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430396, 430321, G03F 900, G03C 500

Patent

active

052601510

ABSTRACT:
Fabrication of submicron design rule large scale integrated circuits depends upon use of a strut-segmented mask with struts providing mechanical support to permit thinned mask segments consequently yielding improved resolution. "Stitching"--positioning of projected segment images to yield a satisfactory continuous image--is aided by lithographically defined skirts forming a continuous border within strut-supported segments.

REFERENCES:
patent: 4780382 (1988-10-01), Stangl et al.
P. Dahl, Introduction to Electron and Ion Optics, Academic Press, New York, N.Y. (1973).
L. M. Myers, Electron Optics, Van Nostrand Co., Inc., New York (1939).
Magnetic Electron Lenses, P. W. Hawkes, ed., Springer-Verlag, New York (1982).
Ludwig Reimer, Transmission Electron Microscopy, pp. 86-99, Spring-Verlag, New York (1984).
"Beam Processing Technologies", VLSI Electronics Microstructure Science, ed. N. G. Einspruch et al, Academic Press, v. 21, pp. 157-203 (1989).
Timoshenko, "Theory of Plates and Shells", McGraw Hill (1940), pp. 228-229.

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