Device manufacture involving lithographic processing

Details Device manufacture involving lithographic processing Device manufacture involving lithographic processing

1992-07-14

1993-11-02

Baxter, Janet C.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

430 5, 430296, 430311, 430395, 430396, 430494, G03F 900

Patent

active

052582469

ABSTRACT:
Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons. Use of such masks is of value as applied to scanning systems providing for dynamic correction of aberrations by physical movement of or field shaping of the objective lens to maintain the optical axis coincident with the scanning information-scanning beam.

REFERENCES:
patent: 3105761 (1963-10-01), Foris
patent: 3630598 (1971-12-01), Little
patent: 3687535 (1972-08-01), Heurtley
patent: 5079112 (1992-01-01), Berger et al.
patent: 5130213 (1992-07-01), Berger et al.
Nakayama, Y. et al, J. Vac. Sci. Technol. B8(6), pp. 1836-1840, Nov./Dec. 1990.

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