Device manufacture involving lithographic processing

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making

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430296, 430311, 430395, 430396, 430494, 430966, 430967, 430 5, G03F 900

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active

050791125

ABSTRACT:
Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on descrimination as between scattered and unscattered radiation.

REFERENCES:
patent: 3105761 (1963-10-01), Foris
patent: 3630598 (1971-12-01), Little, Jr.
patent: 3748468 (1973-07-01), Hartman
patent: 3862843 (1975-01-01), Lerner
Ludwig Reimer, "Transmission Electron Microscopy", Springer Verlag, Berlin, Heidelberg, New York, 1984, pp. 186-198.

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