Device inspection method and apparatus using an asymmetric...

Radiant energy – Photocells; circuits and apparatus – With circuit for evaluating a web – strand – strip – or sheet

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S548000

Reexamination Certificate

active

07112813

ABSTRACT:
A method of device inspection, the method comprising providing an asymmetric marker on a device to be inspected, the form of asymmetry of the marker being dependent upon the parameter to be inspected, directing light at the marker, obtaining a first measurement of the position of the marker via detection of diffracted light of a particular wavelength or diffraction angle, obtaining a second measurement of the position of the marker via detection of diffracted light of a different wavelength or diffraction angle, and comparing the first and second measured positions to determine a shift indicative of the degree of asymmetry of the marker.

REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4251160 (1981-02-01), Bouwhuis et al.
patent: 4326805 (1982-04-01), Feldman et al.
patent: 4355892 (1982-10-01), Mayer et al.
patent: 4398824 (1983-08-01), Feldman et al.
patent: 4514858 (1985-04-01), Novak
patent: 4540277 (1985-09-01), Mayer et al.
patent: 4614432 (1986-09-01), Kuniyoshi et al.
patent: 4690529 (1987-09-01), Sugiyama et al.
patent: 4710026 (1987-12-01), Magome et al.
patent: 4748333 (1988-05-01), Mizutani et al.
patent: 4778275 (1988-10-01), Van Den Brink et al.
patent: 4814829 (1989-03-01), Kosugi et al.
patent: 4828392 (1989-05-01), Nomura et al.
patent: 4857744 (1989-08-01), Kataoka et al.
patent: 4861162 (1989-08-01), Ina
patent: 4870452 (1989-09-01), Tanimoto et al.
patent: 4952970 (1990-08-01), Suzuki et al.
patent: 5047651 (1991-09-01), Wessner et al.
patent: 5100237 (1992-03-01), Wittekoek et al.
patent: 5114236 (1992-05-01), Matsugu et al.
patent: 5118953 (1992-06-01), Ota et al.
patent: 5144363 (1992-09-01), Wittekoek et al.
patent: 5151754 (1992-09-01), Ishibashi et al.
patent: 5160849 (1992-11-01), Ota et al.
patent: 5243195 (1993-09-01), Nishi
patent: 5347356 (1994-09-01), Ota et al.
patent: 5418613 (1995-05-01), Matsutani
patent: 5477057 (1995-12-01), Angeley et al.
patent: 5488230 (1996-01-01), Mizutani et al.
patent: 5489986 (1996-02-01), Magome et al.
patent: 5543921 (1996-08-01), Uzawa et al.
patent: 5559601 (1996-09-01), Gallatin et al.
patent: 5596204 (1997-01-01), Irie et al.
patent: 5674650 (1997-10-01), Dirksen et al.
patent: 5801390 (1998-09-01), Shiraishi
patent: 5808910 (1998-09-01), Irie et al.
patent: 5910847 (1999-06-01), Van der Werf et al.
patent: 5920376 (1999-07-01), Bruckstein et al.
patent: 5920378 (1999-07-01), Murakami et al.
patent: 6034378 (2000-03-01), Shiraishi
patent: 6133641 (2000-10-01), Hamada et al.
patent: 6233494 (2001-05-01), Aoyagi
patent: 6242754 (2001-06-01), Shiraishi et al.
patent: 6297876 (2001-10-01), Bornebroek
patent: 6420791 (2002-07-01), Huang et al.
patent: 6937344 (2005-08-01), Monshouwer et al.
patent: 2001/0026368 (2001-10-01), Mikami
patent: 2002/0021434 (2002-02-01), Nomura et al.
patent: 2002/0041373 (2002-04-01), Littau et al.
patent: 2002/0072003 (2002-06-01), Brill et al.
patent: 2002/0158193 (2002-10-01), Sezginer et al.
patent: 2003/0002043 (2003-01-01), Abdulhalim et al.
patent: 262 510 (1988-11-01), None
patent: 3-257303 (1991-11-01), None
patent: 11-329914 (1999-11-01), None
patent: WO 02/065545 (2002-08-01), None
Markle, D. A., “Submicron 1:1 Optical Lithography”, Semi-conductor International, pp. 173-142, May 1986.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device inspection method and apparatus using an asymmetric... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device inspection method and apparatus using an asymmetric..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device inspection method and apparatus using an asymmetric... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3585191

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.