Device including high-K metal gate finfet and resistive...

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Device protection

Reexamination Certificate

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Details

C257S529000, C257S665000, C257SE21592, C438S132000, C438S281000

Reexamination Certificate

active

08053809

ABSTRACT:
A device is provided that in one embodiment includes a substrate having a first region and a second region, in which a semiconductor device is present on a dielectric layer in the first region of the substrate and a resistive structure is present on the dielectric layer in the second region of the substrate. The semiconductor device may include a semiconductor body and a gate structure, in which the gate structure includes a gate dielectric material present on the semiconducting body and a metal gate material present on the gate dielectric material. The resistive structure may include semiconductor material having a lower surface is in direct contact with the dielectric layer in the second region of the substrate. The resistive structure may be a semiconductor containing fuse or a polysilicon resistor. A method of forming the aforementioned device is also provided.

REFERENCES:
patent: 5057672 (1991-10-01), Bohlender et al.
patent: 6382307 (2002-05-01), Wang et al.
patent: 6580137 (2003-06-01), Parke
patent: 6787424 (2004-09-01), Yu
patent: 7071052 (2006-07-01), Yeo et al.
patent: 7112495 (2006-09-01), Ko et al.
patent: 2005/0040493 (2005-02-01), Yeo et al.
patent: 2008/0157201 (2008-07-01), Marshall
patent: 2010/0244144 (2010-09-01), Hsueh et al.

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