Device for treating substrates in a fluid container

Details Device for treating substrates in a fluid container Device for treating substrates in a fluid container

1996-12-06

1999-07-13

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

139902, 139198, 239560, B08B 302

Patent

active

059212578

ABSTRACT:
A device for treating substrates includes a fluid container in which the substrates are contained during treatment. A nozzle system is connected to the sidewalls and/or bottom of the fluid container and includes a plurality of nozzles for introducing a fluid into the fluid container.

REFERENCES:
patent: 3964957 (1976-06-01), Walsh
patent: 4092176 (1978-05-01), Kozai et al.
patent: 4132567 (1979-01-01), Blackwood
patent: 4671206 (1987-06-01), Hoppestad et al.
patent: 4753258 (1988-06-01), Seiichiro
patent: 4967777 (1990-11-01), Takayama et al.
patent: 5000795 (1991-03-01), Chung et al.
patent: 5002388 (1991-03-01), D'Amato
patent: 5069235 (1991-12-01), Vetter et al.
patent: 5261431 (1993-11-01), Ueno et al.
patent: 5275184 (1994-01-01), Nishizawa et al.
patent: 5286657 (1994-02-01), Bran
patent: 5379785 (1995-01-01), Ohmori et al.
patent: 5443540 (1995-08-01), Kamikawa
patent: 5474616 (1995-12-01), Hayami et al.
patent: 5488964 (1996-02-01), Murakami et al.
patent: 5503171 (1996-04-01), Yokomizo et al.
patent: 5520205 (1996-05-01), Guldi et al.
patent: 5567244 (1996-10-01), Lee et al.
IBM Technical Disclosure Bulletin; vol. 38 No. 04 Apr. 1995 pp. 403-405.
Tetsuya Kaneko et al; "Low . . . UVOC"; Japanese Journal of Applied Physics; vol. 28, No. 12, Dec. 1989; pp. 2425-2429.
IBM Technical Disclosure Bulletin; vol. 34, No. 5, Oct. 1991, p. 331.
IBM Technical Disclosure Bulletin Apr. 1969.

Affiliated with

Also associated with

Rating

Device for treating substrates in a fluid container does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for treating substrates in a fluid container, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for treating substrates in a fluid container will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2267462