Device for treating particulate material

Drying and gas or vapor contact with solids – Apparatus – With fluid current conveying of treated material

Reexamination Certificate

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C034S588000, C034S169000

Reexamination Certificate

active

06898869

ABSTRACT:
A device for treating particulate material has a process chamber. A bottom of the process chamber is composed of baffle plates which overlap one another and between which slots are formed. It is proposed to design the baffle plates as annular plates, so that circular slots are formed, and to place the annular plates in such a way that a radially outer, first flow, directed from outside to inside, of process air passing through, and a radially inner, second flow, directed from inside to outside, of process air passing through are formed, the two opposed flows meeting one another along a circular breaking-up zone and being deflected into a flow directed vertically upwards.

REFERENCES:
patent: 4000563 (1977-01-01), Cubitt et al.
patent: 4360976 (1982-11-01), Meckel et al.
patent: 5282321 (1994-02-01), Huttlin
patent: 5513599 (1996-05-01), Nagato et al.
patent: 6024796 (2000-02-01), Salazar et al.
patent: 6367165 (2002-04-01), Huettlin
patent: 6705025 (2004-03-01), Werner et al.
patent: 31 07 357 (1982-09-01), None
patent: 203 826 (1983-11-01), None
patent: 37 05 353 (1987-09-01), None
patent: 199 04 147 (2000-08-01), None
patent: 1 025 899 (2000-08-01), None

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