Device for thermal treatment of substrates

Heating – Accessory means for holding – shielding or supporting work... – Support structure for heat treating ceramics

Reexamination Certificate

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C211S041180

Reexamination Certificate

active

06953338

ABSTRACT:
The aim of the invention is to reduce the formation of scratches in a device for the thermal treatment of substrates, in particular, semiconductor substrates, in a chamber in which the substrate is placed upon support elements. According to the invention, said aim is achieved by means of displaceable support elements.

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