Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-02-25
1994-01-25
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429826, 20429841, 20419212, C23C 1434
Patent
active
052813215
ABSTRACT:
The invention relates to a device for the suppression of arcs in gas discharge arrangements having two cathodes (6, 7) and one anode (4) supplied from an electric energy source (10). Between the electrical terminals of this electric energy source (10) and the cathode (6, 7) is provided a circuit configuration having two switching elements (15, 25) which upon the occurrence of arcs are through-switched.
REFERENCES:
patent: 4919968 (1990-04-01), Buhl et al.
patent: 4936960 (1990-06-01), Siefkes et al.
"The MDX as a Strategic Tool in Reducing Arcing" by Douglas S. Schatz in 1985.
Sturmer Johann
Teschner Gotz
Leybold Aktiengesellschaft
Nguyen Nam
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