Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Reexamination Certificate
2005-07-12
2005-07-12
Hassanzadad, P. (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
C156S345360, C156S345420, C118S7230MW, C118S7230ME, C118S7230MR, C118S7230MA
Reexamination Certificate
active
06916400
ABSTRACT:
Provided is a device for the microwave-sustained plasma treatment of gases, which comprises a hollow structure forming a waveguide intended to be connected to a microwave generator, and means for making the gas to be treated flow through the said structure in a region in which the amplitude of the electric field associated with the incident wave is high. The means for making the gas flow comprise a plasma torch for producing a plasma in the gas. The torch comprises an injector made of an electrically conducting material mounted on a first large face of the said structure and extending so as to project through an orifice made in a second large face opposite the said first large face. A gap for passage of the incident waves lies around the injector.
REFERENCES:
patent: 5965786 (1999-10-01), Rostaing et al.
patent: 5993612 (1999-11-01), Rostaing et al.
patent: 6190510 (2001-02-01), Rostaing et al.
patent: 6224836 (2001-05-01), Moisan et al.
patent: 6290918 (2001-09-01), Rostaing et al.
patent: 6298806 (2001-10-01), Moisan et al.
patent: 6541917 (2003-04-01), Rostaing et al.
patent: 0 104 109 (1994-03-01), None
patent: 1 014 761 (2000-06-01), None
patent: 2 757 082 (1998-06-01), None
Moisan et al, “The Waveguide Surfatron: A High Power Surface-Wave Launcher to Sustain Large-Diameter Dense Plasma Columns;”Journal of Physics e. Scientific Instruments, vol. 20 (1987), pp. 1356-1361.
Database WPI, Section Ch. Week 199436, Derwent Publications Ltd., XP-002171377.
Moisan et al, “An atmospheric pressure waveguide-fed microwave plasma torch: the TIA Design;”Plasma Sources, Science and Technology, Nov. 1994, vol. 3, No. 4, pp. 584-592.
Bardos et al, “Microwave Surfatron System for Plasma Processing;”Journal of Vacuum Science and Technology: Part A, vol. 14, No. 2, Mar. 1996 pp. 474-477.
Search Report issued in Application No. FR 00 13840.
Keroack Danielle
Moisan Michel
Rostaing Jean-Christophe
Zenon Zakrzewski
Hassanzadad P.
Kackar Ram N
L'Air Liquide Societe Anonyme a Directoire et Conseil de Surveil
LandOfFree
Device for the plasma treatment of gases does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device for the plasma treatment of gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for the plasma treatment of gases will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3383624