Device for the cathode sputtering of a metal

Details Device for the cathode sputtering of a metal Device for the cathode sputtering of a metal

1982-09-30

1984-05-15

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044486529

ABSTRACT:
Device for cathode sputtering of metal, comprising a holder, means for cooling the holder, a heat conducting paste layer disposed on the holder, and a target bolted to the holder with the heat conducting paste layer disposed therebetween as a heat transfer medium, the target being formed of the metal to be sputtered. The heat conducting layer may also be metal powder or foil.

REFERENCES:
patent: 3977955 (1976-08-01), Nevis et al.
patent: 4209375 (1980-06-01), Gates et al.
patent: 4272355 (1981-06-01), Kennedy
patent: 4282924 (1981-08-01), Faretra
patent: 4290876 (1981-09-01), Nishiyama et al.
patent: 4341816 (1982-07-01), Lauterbach et al.
Vossen et al. Thin Film Processes; Academic Press; N.Y.; N.Y.; 1978, pp. 30, 31, 37-39.
Esdonk et al. Vacuum Technology Research Development, Jan. 1975, pp. 41-44.

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