Device for semiconductor integrated circuits

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 4, 357 55, H01L 2978

Patent

active

045463760

ABSTRACT:
A device for semiconductor integrated circuits having a silicon single crystal film formed on a sapphire substrate by hetero epitaxy and isolated islands having side planes. One of the side planes makes an angle of 65.degree. or more with the surface of the sapphire substrate at a part at least more than half thickness from the surface of the silicon single crystal film and makes an angle of 55.degree. or less at a residual thickness.

REFERENCES:
patent: 3586932 (1971-06-01), Kokosa
patent: 3643136 (1972-02-01), Tuft
patent: 4054895 (1977-10-01), Ham
patent: 4110780 (1978-08-01), Cornu

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device for semiconductor integrated circuits does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for semiconductor integrated circuits, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for semiconductor integrated circuits will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2223263

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.