Device for rinsing and drying substrate

Details Device for rinsing and drying substrate Device for rinsing and drying substrate

1994-05-17

1996-05-28

Stinson, Frankie L.

Cleaning and liquid contact with solids

Processes

Including regeneration, purification, recovery or separation...

134 254, 134 952, 1341021, 1341023, 134902, B08B 1500

Patent

active

055207448

ABSTRACT:
Deionized water is supplied into a rinsing bath from its bottom portion and overflows from the upper portion of the rinsing bath to form an upflow of deionized water in the rinsing bath. A substrate is rinsed by being immersed in the upflow of deionized water. After rinsing, the substrate is removed from deionized water, and at this tim the surroundings of the substrate are supplied with vapor of an organic solvent soluble in water which serves to lower surface tension of deionized water to the substrate. Thereafter, the substrate is dried in a sealed chamber that is evacuated and the surroundings of the substrate are reduced in pressure. As a result, during drying the substrate surface after rinsing same with deionized water, it is possible to reduce adhesion of particles to the substrate surface, and to dry the substrate surface rapidly without heating the substrate.

REFERENCES:
patent: 4714086 (1987-12-01), Kishida et al.
patent: 4736758 (1988-04-01), Kusuhara
patent: 5158100 (1992-10-01), Tanaka et al.
patent: 5273589 (1993-12-01), Griswold et al.
patent: 5301701 (1994-04-01), Nafziga
patent: 5331987 (1994-07-01), Hayashi et al.
patent: 5361789 (1994-11-01), Yoshida et al.

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