Gas separation: processes – Selective diffusion of gases – Selective diffusion of gases through substantially solid...
Patent
1994-07-05
1995-06-20
Spitzer, Robert
Gas separation: processes
Selective diffusion of gases
Selective diffusion of gases through substantially solid...
96 6, B01D 1900
Patent
active
054258030
ABSTRACT:
An apparatus and a method for delivering a liquid are disclosed. The liquid contained in a vessel is subjected to a pressurized gas. Any pressurized gas dissolved in the liquid is removed in a degas module by passing the liquid through a gas permeable tube subjected to a pressure differential. Then the liquid is dispensed by a liquid mass flow controller.
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Yasuyuki Yagi, Takashi Imaoka, Yasuhiko Kasama, and Tadahiro Ohmi, "Advanced Ultrapure Water Systems With Low Dissolved Oxygen For Native Oxide Free Wafer Processing," 1992 IEEE, IEEE Transactions on Semiconductor Manufacturing, vol. 5, No. 2, May 1992.
Burkhart Christopher W.
Lind Jeffrey W.
Pomeroy Charles E.
Santiago Tito H.
van Schravendijk Bart J.
Novellus Systems Inc.
Spitzer Robert
Steuber David E.
Suryadevara O. K.
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