Device for regenerating hydrochloric copper chloride etching sol

Details Device for regenerating hydrochloric copper chloride etching sol Device for regenerating hydrochloric copper chloride etching sol

1981-08-17

1983-06-14

Chiesa, Richard L.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Combined

137386, 156345, 156642, 261 36R, 261 64D, 261109, 422106, 423 38, C03C 2506

Patent

active

043882765

ABSTRACT:
Spent hydrochloric copper chloride etching solution used in production of printed circuit boards for etching non-galvanized printed circuits is continuously or cyclically regenerated by spraying spent etching liquid from an interconnected etching machine, as with mist projectors, into an upper area of an enclosed regeneration housing, which is also provided with an oxidating gas selected from oxygen, chlorine and a mixture of oxygen and chlorine. The chemical regeneration reaction takes place within the falling mist and a regenerated etching liquid falls to the bottom of the regeneration housing from where it is pumped back to the connected etching machine or station. Two level switches are positioned at different levels within the interior of the regeneration housing to respectively open or close the gas supply so as to equalize the sub-atmospheric pressure arising within the regeneration housing due to gas consumption and thus maintain a relatively slow increase of the etching solution along the bottom of the housing within optimum limits.

REFERENCES:
patent: 1514939 (1924-11-01), Wallace
patent: 2771460 (1956-11-01), Kooistra
patent: 3306792 (1967-02-01), Thurnel
patent: 3883309 (1975-05-01), Ishizawa
patent: 4042444 (1977-08-01), Snyder
patent: 4101608 (1978-07-01), Bracey

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