Device for providing high-intensity ion or electron beam

Details Device for providing high-intensity ion or electron beam Device for providing high-intensity ion or electron beam

1976-05-07

1977-09-06

Mack, John H.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192SP, 313192, 313306, 313346DC, 314 21, C23C 1500, H01J 1904

Patent

active

040466663

ABSTRACT:
A thin film of a low-thermionic-work-function material is maintained on the cathode of a device for producing a high-current, low-pressure gas discharge by means of sputter deposition from an auxiliary electrode. The auxiliary electrode includes a surface with a low-work-function material, such as thorium, uranium, plutonium or one of the rare earth elements, facing the cathode but at a disposition and electrical potential so as to extract ions from the gas discharge and sputter the low-work-function material onto the cathode. By continuously replenishing the cathode film, high thermionic emissions and ion plasmas can be realized and maintained over extended operating periods.

REFERENCES:
patent: 1760454 (1930-05-01), Ulrey
patent: 1821238 (1931-09-01), Rentschler et al.
patent: 1894946 (1933-01-01), Espe
patent: 3246196 (1966-04-01), Ahmodt et al.
patent: 3348092 (1967-10-01), Beggs
patent: 3467878 (1969-09-01), Newberry
patent: 3474281 (1969-10-01), Vitzthum
patent: 3507774 (1970-04-01), Muly, Jr.

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