Device for producing coatings by means of ion sputtering

Details Device for producing coatings by means of ion sputtering Device for producing coatings by means of ion sputtering

1975-09-10

1977-09-20

Mack, John H.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1500

Patent

active

040495337

ABSTRACT:
A device intended for producing single-layer coatings or films, for example, artificial diamond coatings or films, as well as multilayer or sandwich coatings. The device comprises a plurality of vacuum discharge chambers and at least two pairs of cathodes arranged in each of the chambers. Each pair of cathodes is provided with an anode which is disposed equidistantly from the cathodes forming each respective pair, the anodes of all the pairs of cathodes being arranged in one plane, whereas the cathodes in all the pairs are arranged in two planes that are parallel to the plane in which the anodes are arranged. Articles to be coated are arranged at the point of convergence of atomic beams of the cathode substance being sputtered. Each chamber is provided with a magnetic field source of its own. There is a vacuum evacuation system for all the chambers.

REFERENCES:
patent: 3458426 (1969-07-01), Rausch et al.
patent: 3475315 (1969-10-01), Moseson
patent: 3594301 (1971-07-01), Bruch
patent: 3840451 (1974-10-01), Golyanov et al.

Affiliated with

Also associated with

Rating

Device for producing coatings by means of ion sputtering does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for producing coatings by means of ion sputtering, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for producing coatings by means of ion sputtering will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-669760