Device for processing a substrate, method of processing a...

Details Device for processing a substrate, method of processing a... Device for processing a substrate, method of processing a...

2011-08-23

2011-08-23

Bryant, Kiesha R (Department: 2893)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

C257SE21529

Reexamination Certificate

active

08003411

ABSTRACT:
Provided is a substrate processing apparatus and a method of manufacturing a semiconductor device, which are hard to cause a defect in processing a substrate owing to that a pressure inside a process chamber is not kept constant, and which enable a better processing of a substrate.

REFERENCES:
patent: 6274507 (2001-08-01), Narita et al.
patent: 7682987 (2010-03-01), Yuasa et al.
patent: 2004/0175666 (2004-09-01), Saito
patent: 1 414 061 (2004-04-01), None
patent: A-08-139085 (1996-05-01), None
patent: A-10-223622 (1998-08-01), None
patent: A-2003-045867 (2003-02-01), None
Oct. 30, 2009 Notice of Allowance issued in U.S. Appl. No. 12/225,118.

Affiliated with

Also associated with

Rating

Device for processing a substrate, method of processing a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for processing a substrate, method of processing a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for processing a substrate, method of processing a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2746691