X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1993-06-17
1995-10-10
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 71, G01N 23207
Patent
active
054577276
ABSTRACT:
A device for processing a measured signal corresponding to the intensity reflected, as a function of the glancing angle (.theta.) at an X-ray wavelength (.lambda..sub.RX), by a real multi-layer structure stacked on a substrate (100), which layers exhibit small differences as regards refractive index at their interfaces, transforms the function (f(.theta.)), corresponding to the reflected intensity signal measured as a function of the glancing angle (.theta.) in a range of glancing angles which is bounded by minimum and maximum angular values .theta..sub.min -.theta..sub.max, into a function (F(d)) corresponding to the intensity signal formulated as a function of the depth (d) within the real multi-layer structure, the function (F(d)) obtained enabling a direct representation to be formed of the depth of each interface (d.sub.1, d.sub.2, . . . d.sub.n) of the real structure, and of the associated reflected intensities.
REFERENCES:
patent: 4785470 (1988-11-01), Wood et al.
patent: 5003569 (1991-03-01), Okada et al.
Bruce David Vernon
Porta David P.
Slobod Jack D.
U.S. Philips Corporation
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