Device for preparing a plasma for the production of ozone...

Details Device for preparing a plasma for the production of ozone... Device for preparing a plasma for the production of ozone...

2006-03-07

2006-03-07

Mayekar, Kishor (Department: 1753)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

C422S186040

Reexamination Certificate

active

07008596

ABSTRACT:
A device for the preparation of a plasma for producing ozone and/or oxygen ions in the air following the principle of dielectrically impeded discharge is disclosed. The device comprises: a) a flat, electrically insulating support (1, 7), the material thereof having a dielectric constant εrwhich is at least higher than 30 (that is, εr>thirty); b) an electrode (4) is placed on one of the main surfaces of the support (1, 7), c) at least one electrically insulating layer (2, 8) made of a dielectric material is placed on the other side of the support (1,7); d) the dielectric constant of the support (1, 7) and that of the insulating layer (2, 8) are different, e) an electrode (3, 10) made of an electrically conductive material is mounted an the insulating layer (2, 8), said electrode covering only partially the insulating layer (2, 8) and a high voltage of an AC generator is applied to both electrodes (3, 4).

REFERENCES:
patent: 3954586 (1976-05-01), Lowther
patent: 4049707 (1977-09-01), Harter et al.
patent: 4737885 (1988-04-01), Akutsu
patent: 6136278 (2000-10-01), Eliasson et al.
patent: 3424889 (1986-02-01), None
patent: 0537613 (1993-04-01), None
Patent Abstracts of Japan (Nichimen Denshi R & AMP. DKK) vol. 1997 No. 03 Mar. 31, 1997 & JP 08310801A. Nov. 26, 1996 Abstract.
Patent Abstracts of Japan vol. 1996 No. 07 Jul. 31, 1996 & JP 08 081205A (Toshiba Corp) Mar. 26, 1996 Abstract.
Patent Abstracts of Japan vol. 014 No. 453 (C-0764) Sep. 28, 1990 & JP 02180703A (Noritake Co Ltd) Jul. 13, 1990 Abstract.

Affiliated with

Also associated with

Rating

Device for preparing a plasma for the production of ozone... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for preparing a plasma for the production of ozone..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for preparing a plasma for the production of ozone... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3591157