Device for observing alignment marks on a mask and wafer

Details Device for observing alignment marks on a mask and wafer Device for observing alignment marks on a mask and wafer

1991-07-23

1992-07-28

Turner, Samuel A.

Optics: measuring and testing

By alignment in lateral direction

With light detector

356401, 355 45, 359386, G01B 902

Patent

active

051336030

ABSTRACT:
An observation device for use in observation of a first object and a second object onto which a pattern of the first object is to be projected, the observation device includes a light source; a polarization beam splitter provided between the light source and the first object, for receiving light from the light source and for directing the same to the first and second objects; a first phase converting element provided between the first and second objects, for changing the state of polarization of the light from the light source as incident on the first phase converting element; and a second phase converting element provided to be disposed or to be selectively disposed between the first object and the polarization beam splitter, for changing the state of polarization of reflection light from the first object as incident on the second phase converting element; wherein the first and second objects can be observed by detecting, through the polarization beam splitter, reflection light reflected by the second object ane passing through the first object or by detecting the reflection light and reflection light from the first object.

REFERENCES:
patent: 3853398 (1974-12-01), Kano
patent: 4389084 (1983-06-01), Ban et al.
patent: 4406546 (1983-09-01), Suzuki
patent: 4634240 (1987-01-01), Suzuki et al.
patent: 4645924 (1987-02-01), Suzuki et al.
patent: 4655601 (1987-04-01), Suzuki

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