Device for monitoring the boron content of borophosphosilicate

Chemistry: analytical and immunological testing – Nitrogen containing – Total nitrogen determined

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

436 52, 436 53, 436163, 422 81, 422105, 422108, 422110, 422111, G01N 3506

Patent

active

054686423

ABSTRACT:
A device for monitoring the boron content of the borophosphosilicate, BPSG. The BPSG is obtained by the oxidation of silane, of diborane and of phosphine in a reactor, starting with a first, diborane/silane gas mixture and a second, phosphine/silane gas mixture by monitoring the ratio .rho.=diborane/(diborane+silane) of the mixture resulting from the mixing of the first and second gas mixtures. Monitoring of the boron content is obtained by measuring the density of the first mixture, determining the amount of residual hydrogen in the first mixture and modulating the mass flow rate of the first mixture in response to the calculated ratio .rho..

REFERENCES:
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4369031 (1983-01-01), Goldman et al.
patent: 4379943 (1983-04-01), Yang et al.
patent: 4446168 (1984-05-01), Kato et al.
patent: 4532196 (1985-07-01), Yasoi et al.
patent: 4557950 (1985-10-01), Foster et al.
patent: 4791005 (1988-12-01), Becker et al.
patent: 4845043 (1989-07-01), Catalano
patent: 5187134 (1993-02-01), Panster et al.
patent: 5200043 (1993-04-01), Ooe et al.
patent: 5231047 (1993-07-01), Ovshinsky et al.
Kern et al. "Optimized Chemical Vapor Deposition of Borophosphosilicate Glass Films" RCA Review; vol. 46; Jun. 1985 pp. 117-152.
Kern et al "Chemical Vapor Deposition of Silicate Glasses for Use With Silicon Devices"; J. Electrochem. Soc: Electrochemical Technology; Apr. 1970; pp. 562-568.
(Werner Kern et als) Optimized Chemical Vapor Deposition of Borophosphosilicate Glass Film, R.C.A. Review 46 (1985) Jun. No. 2, Princeton, N.J., USA pp.117-152.
(Werner Kern et als) Chemical Vapor Deposition of Silicate Glasses for Use with Silicon Devices. J. Electrochem, Soc.: Electronchemical Technology, Apr. 1970 p. 562568.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device for monitoring the boron content of borophosphosilicate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for monitoring the boron content of borophosphosilicate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for monitoring the boron content of borophosphosilicate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1136344

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.