Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2008-06-26
2010-10-19
Nguyen, Sang (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S615000, C356S237300, C355S030000, C250S492100
Reexamination Certificate
active
07817262
ABSTRACT:
A device for measuring positions of structures (3) on a substrate (2) is disclosed, wherein the device is enclosed by a climatic chamber (30). An illumination and imaging means (6, 14) is also arranged in the climatic chamber (30). At least one loading station (32) for substrates is formed on an outer wall (30a) of the climatic chamber (30), wherein at least one transport means (34, 40) for transporting the substrates is provided within the climatic chamber (30). A means (36) for orienting the substrates (2) with respect to a coordinate system of the coordinate measuring machine (1) is provided, wherein the transport means (34, 40) deposits the substrates (2) on the means (36) for orienting.
REFERENCES:
patent: 5550633 (1996-08-01), Kamiya
patent: 5909276 (1999-06-01), Kinney et al.
patent: 5914493 (1999-06-01), Morita et al.
patent: 6259960 (2001-07-01), Inokuchi
patent: 6377870 (2002-04-01), Blaesing-Bangert et al.
patent: 6392737 (2002-05-01), Ito et al.
patent: 6580087 (2003-06-01), Suzuki et al.
patent: 6753942 (2004-06-01), Nagahashi
patent: 6923077 (2005-08-01), Kim et al.
patent: 7138629 (2006-11-01), Noji et al.
patent: 7196507 (2007-03-01), Schneidewind et al.
patent: 7265823 (2007-09-01), Kreh et al.
patent: 7522267 (2009-04-01), Hofmeister et al.
patent: 2002/0011835 (2002-01-01), Yamazaki
patent: 2005/0083037 (2005-04-01), Schneidewind et al.
patent: 19949005 (2001-05-01), None
patent: 10304174 (2003-09-01), None
patent: 102004013707 (2005-04-01), None
patent: 10351848 (2005-06-01), None
Dr. Carola Blaesing, Pattern Placement Metrology for Mask Making, Mar. 31, 1998, pp. 1-11, Leica Microsystems AG, Wetzlar, Germany.
Wolfgang Vollrath, DUV microscopy for wafer and mask inspection and metrology, Oct. 1997, pp. 1-5, Leica-Microsystems Wetlzar GmbH, Wetzlar, Germany.
Ehrenberg Tillmann
Goetz Uwe
Schieferstein Guenter
Nguyen Sang
Simpson & Simpson PLLC
Vistec Semiconductor Systems GmbH
LandOfFree
Device for measuring positions of structures on a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device for measuring positions of structures on a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for measuring positions of structures on a substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4235117