Chemistry: physical processes – Physical processes – Crystallization
Patent
1973-10-31
1977-02-01
Scovronek, Joseph
Chemistry: physical processes
Physical processes
Crystallization
23260, 23284, 48196A, 48197R, 252373, 259 4R, B01J 802, C01B 202
Patent
active
040059863
ABSTRACT:
A device for making high temperature reformed gas from coke oven gas and blast furnace gas comprises a continuous heating apparatus for preheating a coke oven gas; and a first system including (a) an intermittent heat exchanger containing therein a packing bed of the heat-accumulator type for preheating a blast furnace gas; (b) a separate cyclone-type gas mixing chamber for mixing the preheated raw gases; and (c) an intermittent reforming furnace containing therein a packing bed of the heat-accumulator type impregnated with a catalyst. A second system comprising counterpart elements (a), (b) and (c) is connected to the apparatus (a) in parallel with the first system so as to be operated alternately with said first system. Bypass valves are preferably provided to feed the blast furnace gas directly to the gas mixing chamber bypassing the intermittent heat exchanger.
REFERENCES:
patent: 2846296 (1958-08-01), Hasche
patent: 2850352 (1958-09-01), Odell
patent: 2890929 (1959-06-01), Rummert
patent: 3132156 (1964-05-01), Lemon et al.
patent: 3234295 (1966-02-01), Sprauer
patent: 3284169 (1966-11-01), Tominaga et al.
patent: 3536455 (1970-10-01), Bogdandy et al.
patent: 3849075 (1974-11-01), Albright et al.
Hironaka Shun-ichi
Ishihara Kazuo
Miyashita Tsuneo
Sano Kazuo
Sasaguri Kyoji
Nippon Kokan Kabushiki Kaisha
Scovronek Joseph
LandOfFree
Device for making high temperature reformed gas does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device for making high temperature reformed gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for making high temperature reformed gas will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1089609