Device for introducing reagents into an organometallic vapor pha

Details Device for introducing reagents into an organometallic vapor pha Device for introducing reagents into an organometallic vapor pha

1992-03-25

1993-07-06

Fox, John C.

Fluid handling

Systems

Multiple inlet with multiple outlet

137240, 137885, F16K 1100

Patent

active

052245136

ABSTRACT:
The device for introducing reagents into an organometallic vapor phase deposition apparatus consists of a valve body having two chambers, each of which can be placed in communication with a passage for the introduction of the reagent and is permanently connected with two passages traversed by carrier gas.

REFERENCES:
patent: 4196748 (1980-04-01), Gillespie
patent: 4846226 (1989-07-01), Merritt
patent: 4869301 (1989-09-01), Ohmi et al.
patent: 4917136 (1990-04-01), Ohmi et al.
patent: 5123443 (1992-06-01), Garrison
Journal of Crystal Growth, No. 77, 1986, R. S. Sillmon et al. pp. 73-78 North-Holland, Amsterdam.

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