Image analysis – Applications – Manufacturing or product inspection
Patent
1996-04-01
1998-07-21
Moore, David K.
Image analysis
Applications
Manufacturing or product inspection
G06K 962
Patent
active
057844844
ABSTRACT:
A pattern inspecting device and associated inspection method are provided that appropriately adjust inspection resolution in accordance with the quality of printed boards under inspection, thereby enabling a reduction of the inspection time. The pattern inspecting device of the present invention is made up of a confirmation station and an optical inspection device section 1 that includes an image signal processor 3, an image analyzer 4, an inspection result processor 5, a CCD camera 6, a pair of illumination lamps 7, and an inspection table 8. The image signal processor 3 A/D converts the image data outputted by the camera, converts this signal to binary, and then to a digital image signal. The image analyzer 4 compares the digital image signal outputted by the image signal processor 3 with standard inspection data and outputs inspection results. The inspection result processor 5 statistically analyzes the inspection result data outputted by the image analyzer 4, selects a resolution appropriate to the analysis results, calculates standard inspection data according to this resolution, and sets the result as the next standard inspection data.
REFERENCES:
patent: 4628531 (1986-12-01), Okamoto et al.
patent: 4764969 (1988-08-01), Ohtombe et al.
patent: 5150423 (1992-09-01), Hoki
patent: 5625703 (1997-04-01), Okuda et al.
Moore David K.
NEC Corporation
Werner Brian P.
LandOfFree
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