Device for generating a subatmospheric pressure

Coating apparatus – With vacuum or fluid pressure chamber

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118209, 118239, 141 65, B05D 140

Patent

active

054436389

ABSTRACT:
A device for generating a subatmospheric pressure at a coating layer on a web-shaped carrier material which is guided over a coating roll. The device is provided with a pressure chamber which is pressurized symmetrically with compressed air via two end-face inflow openings. The compressed air is fed symmetrically to the inflow openings via a manifold unit. From the pressure chamber, the compressed air emerges via a so-called Laval nozzle, thereby generating in a region above the nozzle a subatmospheric pressure which acts on the meniscus of the coating layer during the transition from the gap of the coating die onto the carrier material. Movable seals are provided to permit the width of the nozzle to be adapted to the coating width of the carrier material.

REFERENCES:
patent: 2681294 (1951-08-01), Beguin
patent: 3640752 (1972-02-01), Ishiwata et al.
patent: 3735729 (1973-05-01), Bud
patent: 3916043 (1975-10-01), Fowble
patent: 4245583 (1981-01-01), Schollkopf et al.
patent: 4367691 (1983-01-01), Bergs
patent: 4445458 (1984-05-01), O'Brien
patent: 4490418 (1984-12-01), Yoshida
patent: 4545321 (1985-10-01), Bassa
patent: 4628856 (1986-12-01), Burgdorf
patent: 4844002 (1989-07-01), Yasui et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device for generating a subatmospheric pressure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for generating a subatmospheric pressure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for generating a subatmospheric pressure will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2138973

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.