Device for forming film by photo-chemical vapor deposition

Details Device for forming film by photo-chemical vapor deposition Device for forming film by photo-chemical vapor deposition

1991-12-19

1994-07-12

Thomas, Tom

Coating apparatus

Gas or vapor deposition

With treating means

118715, C23C 1648

Patent

active

053285140

ABSTRACT:
The invention provides a film-forming apparatus by a photo-CVD method comprising such essential structural elements as a light inlet in the form of a tube, a film-forming chamber, a light outlet in the form of a tube and a nozzle for feeding a mixture of a reactant and a gas for dilution so that a specific relation exists in the dimensions between the elements.
With this structure, the film-forming apparatus by a photo-CVD method prevents the blur of the laser beam-incoming window due to contaminants adhered thereto, thereby enabling the extension of reaction time, increase of the deposition, and formation of a film with uniform thickness, and making the composition of the film closest to the stoichiometric one.

REFERENCES:
patent: 4495218 (1985-01-01), Azuma et al.
patent: 4568565 (1986-02-01), Gupta et al.
patent: 5100832 (1992-03-01), Khagawa et al.
G. A. West et al., "Laser Induced Chemical Vapor Deposition of Titanium Silicide Films", Nov. 1985.
P. K. Beyer et al., "Laser Induced Chemical Vapor Deposition of SiO.sub.2 ", Apr. 1985.

Affiliated with

Also associated with

Rating

Device for forming film by photo-chemical vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for forming film by photo-chemical vapor deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for forming film by photo-chemical vapor deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-393305