Device for forming deposited film

Details Device for forming deposited film Device for forming deposited film

1995-05-25

1998-06-23

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118725, C23C 1600

Patent

active

057699500

ABSTRACT:
A device for forming a deposited film is provided. It comprises (a) a reaction chamber; (b) a heating means for heating a substrate placed in the reaction chamber; (c) a starting gas introducing means for introducing starting gases into the reaction chamber, the gas introducing means having a means for introducing two or more kinds of gases alternately and intermittently into the reaction chamber; (d) a decomposing means for decomposing the starting gases in the reaction chamber so as to form a deposited film on the substrate heated by said heating means in the reaction chamber, the decomposing means having a light source which irradiates at least one kind of light into the reaction chamber to decompose the starting gases.

REFERENCES:
patent: 3930908 (1976-01-01), Jolly
patent: 4058430 (1977-11-01), Suntola
patent: 4183780 (1980-01-01), McKenna
patent: 4433951 (1984-02-01), Koch
patent: 4435445 (1984-03-01), Allred
patent: 4461783 (1984-07-01), Yamazaki
patent: 4488506 (1984-12-01), Heinecke
patent: 4503807 (1985-03-01), Nakayama
patent: 4522674 (1985-06-01), Ninomiya
patent: 4525376 (1985-06-01), Edgerton
patent: 4558660 (1985-12-01), Nishizawa
patent: 4569855 (1986-02-01), Matsuda
patent: 4624736 (1986-11-01), Gee
patent: 4625678 (1986-12-01), Shioya
patent: 4640221 (1987-02-01), Barbee
patent: 4645687 (1987-02-01), Donnelly
patent: 4657617 (1987-04-01), Johnson
patent: 4659401 (1987-04-01), Reif
patent: 4668337 (1987-05-01), Sekine
patent: 4687544 (1987-08-01), Bersinn
patent: 4716852 (1988-01-01), Tsujii
patent: 4726963 (1988-02-01), Ishihara
patent: 4761269 (1988-08-01), Conger
patent: 4772485 (1988-09-01), Ebata
Nishizawa, Oyo Buturi, vol. 53 No. 6 1984 pp. 516-520, published Jun., 1984.
Nishizawa, Oyo Buturi, vol. 53, No. 6, pp. 516-520 (Nov. 6, 1984).

Affiliated with

Also associated with

Rating

Device for forming deposited film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for forming deposited film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for forming deposited film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1391092