Device for forming deposited film

Details Device for forming deposited film Device for forming deposited film

1994-09-14

1996-01-09

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118725, C23C 1600

Patent

active

054825571

ABSTRACT:
There is disclosed a device for forming a deposited film which forms a deposited film by bringing a gaseous starting material for formation of a deposited film into contact with a gaseous oxidizing agent having the property of oxidation action on said starting material, thereby causing a chemical reaction to occur, comprising a plural number of chambers for formation of a deposited film connected to one another, said chamber having a gas releasing means having an orifice for releasing said gaseous starting material and an orifice for releasing said gaseous oxidizing agent provided respectively on both wall surfaces opposed to each other, and a support setting means which is arranged so that at least a part of its constitution may be included within the plane formed by linking mutually the gas releasing means on the both wall surfaces.

REFERENCES:
patent: 3652444 (1972-02-01), Lester
patent: 4657777 (1987-04-01), Hirooka

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