Device for forming deposited film

Details Device for forming deposited film Device for forming deposited film

1992-07-08

1993-11-16

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118723R, 118724, 118725, 118665, C23C 1646, C23C 1648, C23C 1650, C23C 1652

Patent

active

052619613

ABSTRACT:
A device for forming a deposited film is provided. It comprises (a) a reaction chamber; (b) a heating means for heating a substrate placed in the reaction chamber; (c) a starting gas introducing means for introducing starting gases into the reaction chamber, the gas introducing means having a means for introducing two or more kinds of gases alternately and intermittently into the reaction chamber; (d) a decomposing means for decomposing the starting gases in the reaction chamber so as to form a deposited film on the substrate heated by said heating means in the reaction chamber, the decomposing means having a light source which irradiates at least one kind of light into the reaction chamber to decompose the starting gases.

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Abeles et al., Physical Review Letters, vol. 51, No. 21, Nov. 21, 1983, pp. 2003-2006.

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