Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1993-08-10
1994-11-22
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118715, 118725, C23C 1600
Patent
active
053665546
ABSTRACT:
There is disclosed a device for forming a deposited film which forms a deposited film by bringing a gaseous starting material for formation of a deposited film into contact with a gaseous oxidizing agent having the property of oxidation action on said starting material, thereby causing a chemical reaction to occur, comprising a plural number of chambers for formation of a deposited film connected to one another, said chamber having a gas releasing means having an orifice for releasing said gaseous starting material and an orifice for releasing said gaseous oxidizing agent provided respectively on both wall surfaces opposed to each other, and a support setting means which is arranged so that at least a part of its constitution may be included within the plane formed by linking mutually the gas releasing means on the both wall surfaces.
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Hanna Jun-ichi
Hirooka Masaaki
Kanai Masahiro
Shimizu Isamu
Bueker Richard
Canon Kabushiki Kaisha
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