Device for forming a deposited film

Details Device for forming a deposited film Device for forming a deposited film

1993-06-08

1995-02-21

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118725, C23C 1600

Patent

active

053912322

ABSTRACT:
There is described a device for forming a deposited film on a substrate in a vacuum chamber through utilization of reaction between a gasifiable starting material for formation of a deposited film and a gaseous halogenic oxidizing agent having the property of oxidization action for the gasifiable starting material which has a gas introducing means comprising a pipe for introducing said gasifiable starting material and a pipe for introducing said gaseous halogenic oxidizing agent where the pipes are arranged in a multi-concentric structure and at least one of the pipes except the outermost pipe is constituted of a porous pipe or has a hole opened through the wall thereof and the outermost pipe has at least one opening oriented toward the substrate.

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