Device for feeding substrates to vacuum systems for deposit of s

Details Device for feeding substrates to vacuum systems for deposit of s Device for feeding substrates to vacuum systems for deposit of s

1997-11-17

2000-11-07

Gupta, Yogendra

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429802, 20429803, 20429827, 2041921, 118719, 118729, C23C 1400

Patent

active

061431486

ABSTRACT:
A process for supplying plants for the coating of substrates involves introducing the substrates batchwise into the vacuum plant and, subsequently, dividing said batches into single substrates in order to allow recovery of the unsaturation percentage, which is connected to the method used to feed in the batch.
The device suitable to provide this process is made up of transport sections capable of giving the substrates forming the batch different speeds from one another, so as to separate them and line them up, with a pre-set constant spacing, in a continuous line of substrates feeding the process chambers (B3, C3).

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patent: 5215420 (1993-06-01), Hughes et al.
patent: 5538560 (1996-07-01), Zejda et al.
patent: 5683561 (1997-11-01), Hollars et al.
patent: 5741405 (1998-04-01), Statnikov et al.
patent: 5784799 (1998-07-01), Kato et al.
patent: 5863338 (1999-01-01), Yamada et al.

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